After spending a week at EMPA in Zurich, Switzerland, depositing high quality TiW thin films in February, Curran, Nathalie and Anna travelled to DESY, Hamburg, Germany, in the first week of March to collect HAXPES data on them. We were back at one of our favourite HAXPES beamlines, P22 at PETRA III, and the work was, as always, expertly supported by the local team of Dr Christoph Schlueter and Dr Andrei Hloskovsky.
In order to ensure that the samples where in the best possible condition for measurement we needed to apply quite an involved level of logistics including vacuum sealing, glove box transferring, and in-situ sputtering. This enabled us to measure the films in their truly metallic state without interference from surface oxidation and contamination. Although HAXPES enables to probe the bulk of a sample, overlying surface oxides can significantly influence and perturb the HAXPES spectral quality. We both explored the influence of Ti/W composition on the electronic structure as well as a challenging experiment to try and probe the buried interface between TiW and the underlying SiO2/Si substructure. We also had time to explore the local offerings of cake and caffeinated beverages.